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產(chǎn)品型號2D Semiconductor

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所  在  地上海

聯(lián)系方式：袁文軍查看聯(lián)系方式

更新時(shí)間：2024-02-08 16:08:46瀏覽次數(shù)：244次

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聯(lián)系人：袁文軍

產(chǎn)品簡介

簡要描述：The 3D Graphene Foam is deposited comformably onto Nickel foam foils by chemical vapor deposition （CVD） process.

詳細(xì)介紹

The 3D Graphene Foam is deposited comformably onto Nickel foam foils by chemical vapor deposition (CVD) process. Nickel (Ni) foams were created by acid reaction at high temperatures, followed by 4-step CVD graphene growth process. Overall, few-layers and single-layers of graphene is deposited onto Ni walls after reacting C2H4 gas with H2 gases. These materials are ideal for gas separation, catalysis, gas detection, sensory applications.

The 3D Graphene Foam is deposited comformably onto Nickel foam foils by chemical vapor deposition (CVD) process. Nickel (Ni) foams were created by acid reaction at high temperatures, followed by 4-step CVD graphene growth process. Overall, few-layers and single-layers of graphene is deposited onto Ni walls after reacting C2H4 gas with H2 gases. These materials are ideal for gas separation, catalysis, gas detection, sensory applications.


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